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Manabu Ohno
Manabu Ohno
Fujitsu
Optics
Electron-beam lithography
Lithography
Physics
Dram
5
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10
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Impact of the coulomb interaction effect on delineating densely repeated 0.1 μm patterns using electron beam block exposure
1997
K. Takahashi
Satoru Yamazaki
Manabu Ohno
Hitoshi Watanabe
Takayuki Sakakibara
Masami Satoh
Takeo Nagata
Akio Yamada
Hiroshi Yasuda
Yasuo Nara
Nobuo Sasaki
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Impact of the Coulomb interaction effect on delineating densely repeated 0.1-μm patterns using electron-beam block exposure
1997
K. Takahashi
Satoru Yamazaki
Manabu Ohno
Hitoshi Watanabe
Takayuki Sakakibara
Masami Satoh
Takeo Nagata
Akio Yamada
Hiroshi Yasuda
Yasuo Nara
Nobuo Sasaki
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Citations (3)
Repetitive One-Tenth Micron Pattern Fabrication Using An EB Block Exposure System
1994
Japanese Journal of Applied Physics
Akio Yamada
Kiichi Sakamoto
Satoru Yamazaki
Katsuhiko Kobayashi
Satoru Sagoh
Manabu Ohno
Hitoshi Watanabe
Hiroshi Yasuda
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Citations (4)
Electron Beam Block Exposure System for 256 M Dynamic Random Access Memory Lithography
1993
Japanese Journal of Applied Physics
Kiichi Sakamoto
Shunsuke Fueki
Satoru Yamazaki
Tomohiko Abe
Katsuhiko Kobayashi
Hisayasu Nishino
Takamasa Satoh
Akio Takemoto
Akio Ookura
Manabu Ohno
Satoru Sagoh
Yoshihisa Oae
Akio Yamada
Junichi Kai
Hiroshi Yasuda
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Citations (3)
Critical heat flux in forced convection boiling of Freon in a tube at high subcritical pressure: In the case of vapor-liquid mixture at inlet
1983
S Yoshida
K. Nishikawa
H Mori
Akio Yamada
Manabu Ohno
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