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Katsuhiko Kobayashi
Katsuhiko Kobayashi
Optics
Electron-beam lithography
Beam (structure)
Dram
Wafer
4
Papers
11
Citations
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Repetitive One-Tenth Micron Pattern Fabrication Using An EB Block Exposure System
1994
Japanese Journal of Applied Physics
Akio Yamada
Kiichi Sakamoto
Satoru Yamazaki
Katsuhiko Kobayashi
Satoru Sagoh
Manabu Ohno
Hitoshi Watanabe
Hiroshi Yasuda
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Citations (4)
Deflector and correction coil calibrations in an electron beam block exposure system
1994
Journal of Vacuum Science & Technology B
Akio Yamada
Kiichi Sakamoto
Satoru Yamazaki
Katsuhiko Kobayashi
S. Sago
M. Oono
H. Watanabe
Hiroshi Yasuda
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Electron‐beam block exposure system for a 256 M dynamic random access memory
1993
Journal of Vacuum Science & Technology B
Kiichi Sakamoto
Shunsuke Fueki
Satoru Yamazaki
Tomohiko Abe
Katsuhiko Kobayashi
Hisayasu Nishino
Takamasa Satoh
A. Takemoto
A. Ookura
M. Oono
S. Sago
Yoshihisa Oae
Akio Yamada
Hiroshi Yasuda
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Citations (4)
Electron Beam Block Exposure System for 256 M Dynamic Random Access Memory Lithography
1993
Japanese Journal of Applied Physics
Kiichi Sakamoto
Shunsuke Fueki
Satoru Yamazaki
Tomohiko Abe
Katsuhiko Kobayashi
Hisayasu Nishino
Takamasa Satoh
Akio Takemoto
Akio Ookura
Manabu Ohno
Satoru Sagoh
Yoshihisa Oae
Akio Yamada
Junichi Kai
Hiroshi Yasuda
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Citations (3)
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