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Jens Stäcker
Jens Stäcker
Materials science
Substrate (chemistry)
structure pattern
Optoelectronics
Wafer
5
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Photomaske und Verfahren zur Verwendung der Photomaske in einer Belichtungsanlage
2005
Lothar Bauch
Anja Bonness
Jens Uwe Bruch
Stefan Geyer
Heiko Hommen
Patrick Klingbeil
Dieter Nees
Roberto Schiwon
Karl Schumacher
Jens Stäcker
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A method of aligning a semiconductor wafer alignment mark and
2003
Heike Drummer
Hans-Georg Froehlich
Werner Graf
Stefan Gruss
Jens Stäcker
Ralph Wienhold
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Verfahren zur Durchführung einer Doppel- oder Mehrfachbelichtung
2003
Jens Uwe Bruch
Heiko Hommen
Karl Schumacher
Jens Stäcker
Marlene Strobl
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Mask, the mask substrate holder and method for performing a double or multiple exposure with the mask and the mask substrate holder
2003
Jens Uwe Bruch
Heiko Hommen
Karl Schumacher
Jens Stäcker
Marlene Strobl
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A method for adjustment and for exposure of a semiconductor wafer
2002
Martin Rössiger
Thorsten Schedel
Jens Stäcker
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