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Roberto Schiwon
Roberto Schiwon
Infineon Technologies
Resist
Electronic engineering
Lithography
Chip
Materials science
6
Papers
15
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Comparison of I-line and DUV high-energy implant litho processes
2006
A. G. Grandpierre
C. Berger
Uwe Schroeder
Roberto Schiwon
Michael Kubis
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Critical dimension variations of I-line processes due to swing effects
2006
C. Berger
Roberto Schiwon
S. Trepte
M. Friedrich
Michael Kubis
J. Horst
A. G. Grandpierre
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Critical dimension control on I-line steppers
2005
Roberto Schiwon
A. G. Grandpierre
Michael Kubis
Uwe Paul Schröder
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Photomaske und Verfahren zur Verwendung der Photomaske in einer Belichtungsanlage
2005
Lothar Bauch
Anja Bonness
Jens Uwe Bruch
Stefan Geyer
Heiko Hommen
Patrick Klingbeil
Dieter Nees
Roberto Schiwon
Karl Schumacher
Jens Stäcker
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Standing wave reduction of positive and negative I-line resists
2005
A. G. Grandpierre
Roberto Schiwon
F. Finger
Uwe Paul Schröder
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Citations (3)
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