Old Web
English
Sign In
Acemap
>
authorDetail
>
Dieter Nees
Dieter Nees
Infineon Technologies
Manufacturing engineering
Engineering drawing
Lithography
Process integration
Wafer
2
Papers
0
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (2)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Photomaske und Verfahren zur Verwendung der Photomaske in einer Belichtungsanlage
2005
Lothar Bauch
Anja Bonness
Jens Uwe Bruch
Stefan Geyer
Heiko Hommen
Patrick Klingbeil
Dieter Nees
Roberto Schiwon
Karl Schumacher
Jens Stäcker
Show All
Source
Cite
Save
Citations (0)
Overlay considerations for 300-mm lithography
2003
Tobias Mono
Uwe Schroeder
Dieter Nees
Katrin Palitzsch
Wolfram Koestler
Jens Uwe Bruch
Sirko Kramp
Markus Veldkamp
Ralf Schuster
Show All
Source
Cite
Save
Citations (0)
1