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Ken Machida
Ken Machida
Samsung
Fluorine
Inorganic chemistry
Etching
Irradiation
Analytical chemistry
5
Papers
12
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Investigating of SER in 28 nm FDSOI-Planar and Comparing with SER in Bulk-FinFET
2020
IRPS | International Reliability Physics Symposium
Taiki Uemura
Byungjin Chung
Jeongmin Jo
Hai Jiang
Yongsung Ji
Tae-Young Jeong
Rakesh Ranjan
Young-in Park
Kiil Hong
Seungbae Lee
Hwa-Sung Rhee
Sangwoo Pae
Eun-Cheol Lee
Jaehee Choi
Shota Ohnishi
Ken Machida
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Citations (2)
Backside Alpha-Irradiation Test in Flip-Chip Package in EUV 7 nm FinFET SRAM
2020
IRPS | International Reliability Physics Symposium
Taiki Uemura
Byungjin Chung
Jeongmin Jo
Hai Jiang
Yongsung Ji
Tae-Young Jeong
Rakesh Ranjan
Seungbae Lee
Hwa-Sung Rhee
Sangwoo Pae
Eun-Cheol Lee
Jaehee Choi
Shota Ohnishi
Ken Machida
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Etching of amorphous carbon layer (a-C) by fluorine and fluorocarbon ions (F + , CF + , CF 3 + )
2017
The Japan Society of Applied Physics
Kazuhiro Karahashi
Hu Li
Kentaro Yamada
Tomoko Ito
Satoshi Numazawa
Ken Machida
Kiyoshi Ishikawa
Satoshi Hamaguchi
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Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation
2017
Japanese Journal of Applied Physics
Kazuhiro Karahashi
Hu Li
Kentaro Yamada
Tomoko Ito
Satoshi Numazawa
Ken Machida
Kiyoshi Ishikawa
Satoshi Hamaguchi
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Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes
2016
Japanese Journal of Applied Physics
Satoshi Numazawa
Ken Machida
M. Isobe
Satoshi Hamaguchi
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Citations (4)
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