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Satoshi Numazawa
Satoshi Numazawa
Samsung
Fluorine
Inorganic chemistry
Etching
Analytical chemistry
Reactive-ion etching
3
Papers
10
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Etching of amorphous carbon layer (a-C) by fluorine and fluorocarbon ions (F + , CF + , CF 3 + )
2017
The Japan Society of Applied Physics
Kazuhiro Karahashi
Hu Li
Kentaro Yamada
Tomoko Ito
Satoshi Numazawa
Ken Machida
Kiyoshi Ishikawa
Satoshi Hamaguchi
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Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation
2017
Japanese Journal of Applied Physics
Kazuhiro Karahashi
Hu Li
Kentaro Yamada
Tomoko Ito
Satoshi Numazawa
Ken Machida
Kiyoshi Ishikawa
Satoshi Hamaguchi
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Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes
2016
Japanese Journal of Applied Physics
Satoshi Numazawa
Ken Machida
M. Isobe
Satoshi Hamaguchi
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Citations (4)
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