Old Web
English
Sign In
Acemap
>
authorDetail
>
Guenther Seitz
Guenther Seitz
Carl Zeiss AG
Optoelectronics
Extreme ultraviolet lithography
Optics
Materials science
Photolithography
4
Papers
50
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Fabrication and metrology of diffraction-limited soft x-ray optics for the EUV microlithography
2004
Udo Dinger
Guenther Seitz
Stefan Schulte
Frank Eisert
Christian Muenster
Stefan Burkart
Siegfried Stacklies
Christian Bustaus
Hubert Hoefer
Maximilian Mayer
Bernhard Fellner
Oliver Hocky
Markus Rupp
Klaus Riedelsheimer
Peter Kuerz
Show All
Source
Cite
Save
Citations (17)
Final Report for Lith 112 High-NA Optics for the Micro-Exposure Tool (MET)
2001
John S. Taylor
P Gabella
Russell M. Hudyma
Gary E. Sommargren
D. W. Phillion
A Johnson
Regina Soufli
E. Spiller
Layton C. Hale
Todd A. Decker
Eric M. Gullikson
P. Kurz
Udo Dinger
Guenther Seitz
Frank Eisert
Stefan Schulte
Show All
Source
Cite
Save
Citations (0)
Optics for EUV lithography
2000
MNC | International Microprocesses and Nanotechnology Conference
P. Kurz
Heinz Mann
Martin Antoni
Wolfgang Singer
Michael Mühlbeyer
Frank Melzer
Udo Dinger
Martin Weiser
Siegfried Stacklies
Guenther Seitz
F. Haidl
E. Sohmen
Winfried Kaiser
Show All
Source
Cite
Save
Citations (9)
Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology
2000
Udo Dinger
Frank Eisert
Holger Lasser
Maximilian Mayer
A. Seifert
Guenther Seitz
Siegfried Stacklies
Franz-Josef Stickel
Martin Weiser
Show All
Source
Cite
Save
Citations (24)
1