Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Udo Dinger,Frank Eisert,Holger Lasser,Maximilian Mayer,A. Seifert,Guenther Seitz,Siegfried Stacklies,Franz-Josef Stickel,Martin Weiser

Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

2000

Udo Dinger
Frank Eisert
Holger Lasser
Maximilian Mayer
A. Seifert
Guenther Seitz
Siegfried Stacklies
Franz-Josef Stickel
Martin Weiser

In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.

Keywords:

Metrology
Nanotechnology
Fabrication
Extreme ultraviolet lithography
Optoelectronics
Materials science

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