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Devesh Thakare
Devesh Thakare
IMEC
Optoelectronics
Materials science
Extreme ultraviolet lithography
Refractive index
simulation based
3
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2
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0
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2024
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First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
2021
Jetske Stortelder
Robert P. Ebeling
Corné Rijnsent
Michel van Putten
Véronique de Rooij-Lohmann
Maximilian Smit
Arnold Storm
N.B. Koster
Henk A. Lensen
Vicky Philipsen
Karl Opsomer
Devesh Thakare
Torsten Feigl
Philipp Naujok
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Study of novel EUVL mask absorber candidates
2021
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
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Mask absorber for next generation EUV lithography
2020
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
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