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Jean-Philippe Soulié
Jean-Philippe Soulié
IMEC
Materials science
Extreme ultraviolet lithography
Optoelectronics
Refractive index
Thin film
3
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2
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0
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2024
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Optical constants for EUV scatterometry
2021
Richard Ciesielski
Qais Saadeeh
Philipp Naujok
Karl Opsomer
Jean-Philippe Soulié
Meiyi Wu
Vicky Philipsen
Robbert Wilhelmus Elisabeth van de Kruijs
Michael Kolbe
Frank Scholze
Victor Soltwisch
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Study of novel EUVL mask absorber candidates
2021
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
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Mask absorber for next generation EUV lithography
2020
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
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