Old Web
English
Sign In
Acemap
>
authorDetail
>
Meiyi Wu
Meiyi Wu
IMEC
Materials science
Extreme ultraviolet lithography
Optoelectronics
Refractive index
Thin film
4
Papers
2
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Optical constants for EUV scatterometry
2021
Richard Ciesielski
Qais Saadeeh
Philipp Naujok
Karl Opsomer
Jean-Philippe Soulié
Meiyi Wu
Vicky Philipsen
Robbert Wilhelmus Elisabeth van de Kruijs
Michael Kolbe
Frank Scholze
Victor Soltwisch
Show All
Source
Cite
Save
Citations (0)
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
2021
Meiyi Wu
Jean-Francois de Marneffe
Karl Opsomer
Christophe Detavernier
Annelies Delabie
Philipp Naujok
Özge Caner
Andy Goodyear
Mike Cooke
Qais Saadeh
Victor Soltwisch
Frank Scholze
Vicky Philipsen
Show All
Source
Cite
Save
Citations (0)
Study of novel EUVL mask absorber candidates
2021
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
Show All
Source
Cite
Save
Citations (1)
Mask absorber for next generation EUV lithography
2020
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
Show All
Source
Cite
Save
Citations (1)
1