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Markus Foltin
Markus Foltin
SUSS MicroTec
Optoelectronics
Materials science
Refractive index
Extreme ultraviolet lithography
simulation based
2
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2
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2024
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Study of novel EUVL mask absorber candidates
2021
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
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Mask absorber for next generation EUV lithography
2020
Meiyi Wu
Devesh Thakare
Jean-Francois de Marneffe
Patrick Jaenen
Laurent Souriau
Karl Opsomer
Jean-Philippe Soulié
Andreas Erdmann
Hazem Mesilhy
Philipp Naujok
Markus Foltin
Victor Soltwisch
Qais Saadeh
Vicky Philipsen
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Citations (1)
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