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Véronique de Rooij-Lohmann
Véronique de Rooij-Lohmann
Netherlands Organisation for Applied Scientific Research
Materials science
Extreme ultraviolet lithography
Scanner
X-ray photoelectron spectroscopy
Critical dimension
3
Papers
2
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0
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2024
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First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
2021
Jetske Stortelder
Robert P. Ebeling
Corné Rijnsent
Michel van Putten
Véronique de Rooij-Lohmann
Maximilian Smit
Arnold Storm
N.B. Koster
Henk A. Lensen
Vicky Philipsen
Karl Opsomer
Devesh Thakare
Torsten Feigl
Philipp Naujok
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Study of EUV reticle storage effects through exposure on EBL2 and NXE
2020
Rik Jonckheere
Vineet Vijayakrishnan Nair
Eric Hendrickx
Remko Aubert
Chien-Ching Wu
Véronique de Rooij-Lohmann
Dorus Elstgeest
Henk A. Lensen
Victor Soltwisch
Philipp Hoenicke
Michael Kolbe
Frank Scholze
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Lifetime test on EUV photomask with EBL2
2019
Chien-Ching Wu
Markus Bender
Rik Jonckheere
Frank Scholze
Herman H. P. Th. Bekman
Michel van Putten
Rory de Zanger
Rob Ebeling
Jeroen Westerhout
Kyri Nicolai
Jacqueline van Veldhoven
Véronique de Rooij-Lohmann
O. Kievit
Alex Deutz
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Citations (2)
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