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Oliver Roempp

Carl Zeiss AG

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Performance of a high productivity 300 mm dual stage 193 nm 0.75 NA TWINSCAN AT:1100B system for 100 nm applications

2003 Journal of Micro-nanolithography Mems and Moems
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Performance of a high-productivity 300-mm dual-stage 193-nm 0.75-NA TWINSCAN AT:1100B system for 100-nm applications

2002
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ArF step-and-scan system with 0.75 NA for the 0.10μm node

2001
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ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

1999
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Citations (1)