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Hans Burgers
Hans Burgers
ASML Holding
Laser
Optics
Throughput
Wafer
Lithography
2
Papers
4
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Performance of a high productivity 300 mm dual stage 193 nm 0.75 NA TWINSCAN AT:1100B system for 100 nm applications
2003
Journal of Micro-nanolithography Mems and Moems
Rian Rubingh
Youri van Dommelen
Sjef Tempelaars
Marc Boonman
Roger Irwin
Edwin van Donkelaar
Hans Burgers
Guustaaf Savenije
Bert Koek
Michael Thier
Oliver Roempp
Christian Hembd-Soellner
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Citations (2)
Performance of a high-productivity 300-mm dual-stage 193-nm 0.75-NA TWINSCAN AT:1100B system for 100-nm applications
2002
Rian Rubingh
Youri van Dommelen
Sjef Tempelaars
Marc Boonman
Roger Irwin
Edwin van Donkelaar
Hans Burgers
Guustaaf Savenaije
Bert Koek
Michael Thier
Oliver Roempp
Christian Hembd-Soellner
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Citations (2)
1