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Sjef Tempelaars

ASML Holding

4

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Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness

2004
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The performance advantages of a dual-stage system

2004
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Performance of a high productivity 300 mm dual stage 193 nm 0.75 NA TWINSCAN AT:1100B system for 100 nm applications

2003 Journal of Micro-nanolithography Mems and Moems
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Performance of a high-productivity 300-mm dual-stage 193-nm 0.75-NA TWINSCAN AT:1100B system for 100-nm applications

2002
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Citations (2)