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Guustaaf Savenije
Guustaaf Savenije
ASML Holding
Photolithography
Wafer
Lithography
Metrology
Laser
2
Papers
18
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Performance of a high productivity 300 mm dual stage 193 nm 0.75 NA TWINSCAN AT:1100B system for 100 nm applications
2003
Journal of Micro-nanolithography Mems and Moems
Rian Rubingh
Youri van Dommelen
Sjef Tempelaars
Marc Boonman
Roger Irwin
Edwin van Donkelaar
Hans Burgers
Guustaaf Savenije
Bert Koek
Michael Thier
Oliver Roempp
Christian Hembd-Soellner
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Citations (2)
Performance results of a new generation of 300-mm lithography systems
2001
Boudewijn Sluijk
Tom Castenmiller
Richard du Croo de Jongh
Hans Jasper
Theo Modderman
Leon Martin Levasier
Erik Roelof Loopstra
Guustaaf Savenije
Marc Boonman
Harry H. H. M. Cox
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Citations (16)
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