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J. Thomas
J. Thomas
Intel
Electronic engineering
Transistor
Engineering
Reliability (semiconductor)
Metal gate
2
Papers
68
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Self-heat reliability considerations on Intel's 22nm Tri-Gate technology
2013
IRPS | International Reliability Physics Symposium
C. Prasad
Lei Jiang
D. Singh
M. Agostinelli
C. Auth
P. Bai
T. Eiles
J. Hicks
C-H Jan
K. Mistry
S. Natarajan
B. Niu
P. Packan
Daniel Pantuso
I. Post
S. Ramey
Anthony Schmitz
Bernhard Sell
S. Suthram
J. Thomas
Curtis Tsai
P. Vandervoorn
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Citations (56)
Gate dielectric TDDB characterizations of advanced High-k and metal-gate CMOS logic transistor technology
2012
IRPS | International Reliability Physics Symposium
S. Pae
C. Prasad
S. Ramey
J. Thomas
Anisur Rahman
Ryan Lu
J. Hicks
S. Batzer
Q. Zhao
J. Hatfield
M. Liu
C. Parker
Bruce Woolery
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Citations (12)
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