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K. Suresh
K. Suresh
GlobalFoundries
Engineering
Wafer
Rapid thermal processing
Sheet resistance
Silicon
3
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An integrated advanced process control on RTP gate oxide thickness and feed-forward implant compensation in mass production
2012
ASMC | Advanced Semiconductor Manufacturing Conference
Zhang Jian
Liu Shi Xiang
Lei Ming
Ling Syau Yun
Lim Ming Chou
K. Suresh
Tan Miow Chin
Vish Srinivasan
Peter Benyon
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Experimental investigation and manufacturing solution of the rapid thermal process induced overlay residue
2012
ASMC | Advanced Semiconductor Manufacturing Conference
Weihua Tong
Really Kim
Bharat Krishnan
Sung Kim
Olivier Vatel
Xuli Liu
Lei Huang
K. Suresh
Miowchin Tan
Vish Srinivasan
Peter Benyon
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Cost effective and robust nickel silicidation process qualification and chamber matching in rapid thermal processing tools
2011
ASMC | Advanced Semiconductor Manufacturing Conference
Weihua Tong
K. Suresh
Miowchin Tan
Peter Benyon
Vish Srinivasan
Jinping Liu
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