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Weihua Tong
Weihua Tong
GlobalFoundries
Wafer
Sheet resistance
Engineering
Silicon
Rapid thermal processing
4
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4
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Wafer Level Variability Improvement by Spatial Source/Drain Activation and Ion Implantation Super Scan for FinFET Technology
2018
IEEE Transactions on Semiconductor Manufacturing
Yanzhen Wang
Yoong Yong
Bingwu Liu
Dibao Zhou
Mitsuhiro Togo
Dongil Choi
J. G. Lee
Hsien-Ching Lo
Xinyuan Dou
Sipeng Gu
Shashidhar Shintri
Weihua Tong
Vidmantas Sargunas
Jorge Argandona
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Low temperature ISSG oxidation and its application in SSRW for 20nm and below semiconductor devices
2013
INEC | IEEE International Nanoelectronics Conference
Weihua Tong
Really Kim
Zhao Lun
Henry Lim
Sung Kim
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Experimental investigation and manufacturing solution of the rapid thermal process induced overlay residue
2012
ASMC | Advanced Semiconductor Manufacturing Conference
Weihua Tong
Really Kim
Bharat Krishnan
Sung Kim
Olivier Vatel
Xuli Liu
Lei Huang
K. Suresh
Miowchin Tan
Vish Srinivasan
Peter Benyon
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Cost effective and robust nickel silicidation process qualification and chamber matching in rapid thermal processing tools
2011
ASMC | Advanced Semiconductor Manufacturing Conference
Weihua Tong
K. Suresh
Miowchin Tan
Peter Benyon
Vish Srinivasan
Jinping Liu
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