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Really Kim
Really Kim
GlobalFoundries
Wafer
Residue (complex analysis)
Engineering
Sheet resistance
Overlay
2
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1
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Low temperature ISSG oxidation and its application in SSRW for 20nm and below semiconductor devices
2013
INEC | IEEE International Nanoelectronics Conference
Weihua Tong
Really Kim
Zhao Lun
Henry Lim
Sung Kim
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Experimental investigation and manufacturing solution of the rapid thermal process induced overlay residue
2012
ASMC | Advanced Semiconductor Manufacturing Conference
Weihua Tong
Really Kim
Bharat Krishnan
Sung Kim
Olivier Vatel
Xuli Liu
Lei Huang
K. Suresh
Miowchin Tan
Vish Srinivasan
Peter Benyon
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