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S. Tourniol
S. Tourniol
STMicroelectronics
Next-generation lithography
X-ray lithography
Materials science
Electron-beam lithography
Nanotechnology
3
Papers
14
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Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
2004
Laurent Pain
M. Jurdit
Yves Laplanche
J. Todeschini
Serdar Manakli
G. Bervin
R. Palla
A. Beverina
R. Faure
X. Bossy
H. Leininger
S. Tourniol
M. Broekaart
F. Judong
K. Brosselin
P. Gouraud
Veronique De Jonghe
Daniel Henry
M. Woo
P. Stolk
B. Tavel
F. Arnaud
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Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction
2003
Laurent Pain
Murielle Charpin
Yves Laplanche
David Herisson
J. Todeschini
R. Palla
A. Beverina
H. Leininger
S. Tourniol
M. Broekaart
Emmanuelle Luce
F. Judong
K. Brosselin
Y. Le Friec
F. Leverd
S. Del Medico
V. De Jonghe
Daniel Henry
M. Woo
F. Arnaud
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Citations (3)
1