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R. Faure
R. Faure
STMicroelectronics
Next-generation lithography
X-ray lithography
Analytical chemistry
Materials science
Electron-beam lithography
2
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11
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Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
2004
Laurent Pain
M. Jurdit
Yves Laplanche
J. Todeschini
Serdar Manakli
G. Bervin
R. Palla
A. Beverina
R. Faure
X. Bossy
H. Leininger
S. Tourniol
M. Broekaart
F. Judong
K. Brosselin
P. Gouraud
Veronique De Jonghe
Daniel Henry
M. Woo
P. Stolk
B. Tavel
F. Arnaud
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Citations (3)
65 nm device manufacture using shaped E-Beam lithography
2003
MNC | International Microprocesses and Nanotechnology Conference
Laurent Pain
Murielle Charpin
Yves Laplanche
J. Todeschini
H. Leininger
S. Tourniol
R. Faure
X. Bossy
R. Palla
A. Beverina
M. Broekaart
F. Judong
K. Brosselin
Y. Le Friec
F. Leverd
V. De Jonghe
E. Josse
O. Hinsinger
P. Brun
Daniel Henry
M. Woo
P. Stolk
F. Arnaud
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Citations (8)
1