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Remko Aubert
Remko Aubert
IMEC
Extreme ultraviolet lithography
Materials science
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Optics
5
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2
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0
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Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures
2021
Joost Bekaert
Emily Gallagher
Rik Jonckheere
Lieve Van Look
Remko Aubert
Vineet Vijayakrishnan Nair
Marina Y. Timmermans
Ivan Pollentier
Eric Hendrickx
Alexander Klein
Gökay Yegen
Par Broman
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Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align
2021
Joern-Holger Franke
Andreas Frommhold
Natalia Davydova
Remko Aubert
Vineet Vijayakrishnan Nair
Tatiana Kovalevich
David Rio
Joost Bekaert
Erik Wang
Gijsbert Rispens
Mark John Maslow
Eric Hendrickx
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CNT pellicles: Imaging results of the first full-field EUV exposures
2021
Joost Bekaert
Emily Gallagher
Rik Jonckheere
Lieve Van Look
Remko Aubert
Vineet Vijayakrishnan Nair
Marina Y. Timmermans
Ivan Pollentier
Eric Hendrickx
Alexander Klein
Gökay Yegen
Par Broman
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Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry
2020
Vineet Vijayakrishnan Nair
Lieve Van Look
Remko Aubert
Eric Hendrickx
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Study of EUV reticle storage effects through exposure on EBL2 and NXE
2020
Rik Jonckheere
Vineet Vijayakrishnan Nair
Eric Hendrickx
Remko Aubert
Chien-Ching Wu
Véronique de Rooij-Lohmann
Dorus Elstgeest
Henk A. Lensen
Victor Soltwisch
Philipp Hoenicke
Michael Kolbe
Frank Scholze
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