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Chien-Ching Wu
Chien-Ching Wu
Netherlands Organisation for Applied Scientific Research
Extreme ultraviolet lithography
Materials science
X-ray photoelectron spectroscopy
Optics
Photomask
5
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5
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Study of EUV reticle storage effects through exposure on EBL2 and NXE
2020
Rik Jonckheere
Vineet Vijayakrishnan Nair
Eric Hendrickx
Remko Aubert
Chien-Ching Wu
Véronique de Rooij-Lohmann
Dorus Elstgeest
Henk A. Lensen
Victor Soltwisch
Philipp Hoenicke
Michael Kolbe
Frank Scholze
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Additional real-time diagnostics on the EBL2 EUV exposure facility
2020
Peter van der Walle
J. K. Stortelder
Chien-Ching Wu
Henk A. Lensen
N.B. Koster
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Lifetime test on EUV photomask with EBL2
2019
Chien-Ching Wu
Markus Bender
Rik Jonckheere
Frank Scholze
Herman H. P. Th. Bekman
Michel van Putten
Rory de Zanger
Rob Ebeling
Jeroen Westerhout
Kyri Nicolai
Jacqueline van Veldhoven
Véronique de Rooij-Lohmann
O. Kievit
Alex Deutz
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Compatibility assessment of novel reticle absorber materials for use in EUV lithography systems.
2019
Jetske Stortelder
Arnold Storm
Veronique de Rooij-Lohmann
Chien-Ching Wu
Willem van Schaik
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EUV mask lifetime testing using EBL2
2018
Chien-Ching Wu
Edwin te Sligte
Herman Bekman
Arnold J. Storm
Michel van Putten
Maurice P.M. A. Limpens
Jacqueline van Veldhoven
Alex Deutz
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