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Kazuyoshi Oonuki
Kazuyoshi Oonuki
Hitachi
Engineering
Electronic engineering
Critical dimension
Reticle
Proximity effect (audio)
5
Papers
6
Citations
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Technology of EB Lithography System for 65-nm Node Mask Writing
2005
Hajime Kawano
Yasuhiro Kadowaki
Kazuyoshi Oonuki
Hiroya Ohta
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Improved Image Placement Performance of HL-7000M
2003
Masaomi Tanaka
Hiroyuki Ito
Hiroyuki Takahashi
Kazuyoshi Oonuki
Yasuhiro Kadowaki
Hidetoshi Sato
Hajime Kawano
Zhigang Wang
Kazui Mizuno
Genya Matsuoka
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Technological capability and future enhanced performance of HL-7000M
2003
Masaomi Tanaka
Suyo Asai
Hajime Kawano
Ken Iizumi
Kazuyoshi Oonuki
Hiroyoshi Takahashi
Hidetoshi Sato
Rikio Tomiyoshi
Kazui Mizuno
Genya Matsuoka
Hiroya Ohta
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Technologies for electron-beam reticle writing systems for 130-nm node and below
2002
Genya Matsuoka
Hidetoshi Satoh
Akira Fujii
Kazui Mizuno
Tetsuji Nakahara
Suyo Asai
Yasuhiro Kadowaki
Hajime Shimada
Hiroshi Touda
Ken Iizumi
Hiroyuki Takahashi
Kazuyoshi Oonuki
Toshikazu Kawahara
Katsuhiro Kawasaki
Koji Nagata
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Advanced e-beam reticle writing system for next-generation reticle fabrication
2000
Akira Fujii
Kazui Mizuno
Tetsuji Nakahara
Suyo Asai
Yasuhiro Kadowaki
Hajime Shimada
Hiroshi Touda
Ken Iizumi
Hiroyuki Takahashi
Kazuyoshi Oonuki
Toshikazu Kawahara
Katsuhiro Kawasaki
Koji Nagata
Hidetoshi Satoh
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Citations (4)
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