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Akira Fujii

Hitachi

5

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Technologies for electron-beam reticle writing systems for 130-nm node and below

2002
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High-resolution and high-stability electromagnetic-deflection control system for EB lithography system

2001
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Advanced e-beam reticle writing system for next-generation reticle fabrication

2000
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Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography

1994
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