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Taku Ninomiya
Taku Ninomiya
Hitachi
Optics
Metrology
Materials science
Monte Carlo method
Critical dimension
7
Papers
15
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High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features
2020
Journal of Micro-nanolithography Mems and Moems
Wei Sun
Hiroya Ohta
Taku Ninomiya
Yasunori Goto
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High voltage CD-SEM based metrology for 3D-profile measurement using depth-correlated BSE signal
2019
Wei Sun
Yasunari Sohda
Hiroya Ohta
Taku Ninomiya
Yasunori Goto
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Inspection-analysis Solution for High-quality and High-efficiency Device Manufacturing
2005
Mari Nozoe
Hiroyuki Shinada
Taku Ninomiya
Seiji Isogai
Yoji Ichiyasu
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Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography
1994
Masahiro Watanabe
Yoshitada Oshida
Yasuhiko Nakayama
Minoru Yoshida
Ryuichi Funatsu
Akira Fujii
Taku Ninomiya
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Citations (7)
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