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Nadia Vandenbroeck

Katholieke Universiteit Leuven

7

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42

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Directed self-assembly process integration – fin patterning

2015
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Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning

2013 Journal of Micro-nanolithography Mems and Moems
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DSA as a complementary lithography technique for contact hole patterning

2013
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Spectral analysis of line width roughness and its application to immersion lithography

2006 Journal of Micro-nanolithography Mems and Moems
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