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Xiaoping Shi
Xiaoping Shi
Katholieke Universiteit Leuven
Surface finish
Contact angle
Nanotechnology
Attenuated total reflection
Wetting transition
2
Papers
15
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Partial Wetting of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish
2014
ECS Journal of Solid State Science and Technology
G. Vereecke
XiuMei Xu
W. K. Tsai
Hui Yang
Silvia Armini
Tinne Delande
Geert Doumen
F. Kentie
Xiaoping Shi
I. Simms
K. Nafus
Frank Holsteyns
Herbert Struyf
S. De Gendt
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Citations (12)
Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning
2013
Journal of Micro-nanolithography Mems and Moems
Kaidong Xu
Laurent Souriau
David Hellin
J. Versluijs
Patrick Wong
Diziana Vangoidsenhoven
Nadia Vandenbroeck
Harold Dekkers
Xiaoping Shi
Johan Albert
Chi Lim Tan
Johan Vertommen
Bart Coenegrachts
Isabelle Orain
Yoshie Kimura
Vincent Wiaux
Werner Boullart
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Citations (3)
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