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Wolfram Koestler
Wolfram Koestler
Infineon Technologies
Wafer
Lithography
Engineering
Dram
Electronic engineering
7
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4
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OPC for double exposure lithography
2005
Thorsten Winkler
Wolfgang Dettmann
Mario Hennig
Wolfram Koestler
Molela Moukara
Joerg Thiele
Karsten Zeiler
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Overlay considerations for 300-mm lithography
2003
Tobias Mono
Uwe Schroeder
Dieter Nees
Katrin Palitzsch
Wolfram Koestler
Jens Uwe Bruch
Sirko Kramp
Markus Veldkamp
Ralf Schuster
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Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners
2000
Thorsten Schedel
Alain Charles
Dietmar Ganz
Steffen Hornig
Guenther Hraschan
Wolfram Koestler
John Maltabes
Karl E. Mautz
Thomas Metzdorf
Ralf Otto
Sebastian Schmidt
Ralf Schuster
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Is lithography ready for 300 mm
2000
Alain Charles
Clint Haris
Steffen Hornig
Dietmar Ganz
Thorsten Schedel
Guenther Hraschan
Wolfram Koestler
John Maltabes
Karl E. Mautz
Sebastian Schmidt
Ralf Schuster
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Sub 0.2 /spl mu/m lithography on 300 mm wafer
2000
ISSM | International Symposium on Semiconductor Manufacturing
Dietmar Ganz
Alain Charles
Steffen Hornig
Guenther Hraschan
Wolfram Koestler
John Maltabes
Thorsten Schedel
Sebastian Schmidt
Karl E. Mautz
Ralf Schuster
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