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Gerhard Braun
Gerhard Braun
Optics
Extreme ultraviolet lithography
wavelength range
projection lens
Polymer science
3
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Reflektives optisches Abbildungssystem
2010
Gerhard Braun
Aurelian Dodoc
Hans-Jürgen Mann
Sascha Migura
Hans-Jochen Paul
Christoph Zaczek
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Mirror for the EUV wavelength range, a substrate for such a mirror, using a quartz layer of such a substrate, projection objective for microlithography with such a mirror or such a substrate and Projetktionsbelichtungsanlage for microlithography comprising such a projection lens
2009
Gerhard Braun
Wilfried Clauss
Aurelian Dodoc
Stephan Müllender
Hans-Jochen Paul
Migura Sascha
Jörn Weber
Christoph Zaczek
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Mirror for the EUV wavelength range the projection objective for microlithography with such a mirror and the projection exposure system for microlithography with a projection lens such
2009
Gerhard Braun
Aurelian Dodoc
Sascha Migura
Hans-Jochen Paul
Christoph Zaczek
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