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Migura Sascha
Migura Sascha
Extreme ultraviolet lithography
Crystallography
Optics
Materials science
wavelength range
2
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EUV High-NA scanner and mask optimization for sub 8nm resolution
2016
Van Schoot Jan
Van Ingen Schenau Koen
Bottiglieri Gerardo
Troost Kars
Zimmerman John
Migura Sascha
Kneer Bernhard
Neumann Jens Timo
Kaiser Winfried
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Mirror for the EUV wavelength range, a substrate for such a mirror, using a quartz layer of such a substrate, projection objective for microlithography with such a mirror or such a substrate and Projetktionsbelichtungsanlage for microlithography comprising such a projection lens
2009
Gerhard Braun
Wilfried Clauss
Aurelian Dodoc
Stephan Müllender
Hans-Jochen Paul
Migura Sascha
Jörn Weber
Christoph Zaczek
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