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Y. Hirose
Y. Hirose
Mitsubishi Electric
Materials science
Radiochemistry
Boron
Ionization
Crystal
2
Papers
1
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0.15 μm CMOS process for high performance and high reliability
1994
International Electron Devices Meeting
S. Shimizu
T. Kuroi
Maiko Kobayashi
Takehisa Yamaguchi
T. Fujino
H. Maeda
T. Tsutsumi
Y. Hirose
Shigeru Kusunoki
Masahide Inuishi
Natsuro Tsubouchi
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Control of Secondary Defects by Tin Diffusion in Ion Implanted Silicon Crystals
1975
Genshiro Nakamura
Y. Yukimoto
Y. Hirose
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