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Maiko Kobayashi
Maiko Kobayashi
Mitsubishi Electric
Gate oxide
Nitrogen
Materials science
Silicon
CMOS
3
Papers
15
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The Impact of Nitrogen Implantation into Highly Doped Polysilicon Gates for Highly Reliable and High-Performance Sub-Quarter-Micron Dual-Gate Complementary Metal Oxide Semiconductor
1995
Japanese Journal of Applied Physics
T. Kuroi
Maiko Kobayashi
Masayoshi Shirahata
Yoshiki Okumura
Shigeru Kusunoki
Masahide Inuishi
Natsuro Tsubouchi
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Citations (14)
0.15 μm CMOS process for high performance and high reliability
1994
International Electron Devices Meeting
S. Shimizu
T. Kuroi
Maiko Kobayashi
Takehisa Yamaguchi
T. Fujino
H. Maeda
T. Tsutsumi
Y. Hirose
Shigeru Kusunoki
Masahide Inuishi
Natsuro Tsubouchi
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Effects of nitrogen implantation into P+ poly-silicon gate on gate oxide properties
1994
Symposium on VLSI Technology
T. Kuroi
Shigeru Kusunoki
Masayoshi Shirahata
Y. Okumura
Maiko Kobayashi
Masahide Inuishi
Natsuro Tsubouchi
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