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M. Yamanaka

Sony Broadcast & Professional Research Laboratories

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PMOSFET Vth Modulation Technique using Fluorine Treatment through ALD-TiN Suitable for CMOS Devices

2007 The Japan Society of Applied Physics
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High Performance Dual Metal Gate CMOS with High Mobility and Low Threshold Voltage Applicable to Bulk CMOS Technology

2006 VLSIT | Symposium on VLSI Technology
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High Performance pMOSFET with ALD-TiN/HfO2 Gate Stack on (110) Substrate by Low Temperature Process

2006 ESSDERC | European Solid-State Device Research Conference
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