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C. Lim

SEMATECH

7

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102

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Effect of deposition sequence and plasma treatment on ALCVD™ HfO 2 N-MOSFET properties

2003
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Conventional poly-Si gate MOS-transistors with a novel, ultra-thin Hf-oxide layer

2003 VLSIT | Symposium on VLSI Technology
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Charges in HFO2 ALD gate dielectrics

2003
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Plasma nitridation of very thin gate dielectrics

2001 Microelectronic Engineering
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Citations (9)