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Nirmal Chaudhary

SEMATECH

5

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Subnanometer Scaling of HfO2/Metal Electrode Gate Stacks

2004 Electrochemical and Solid State Letters
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Integration issues of high-k gate stack: Process-induced charging

2004 IRPS | International Reliability Physics Symposium
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Effect of deposition sequence and plasma treatment on ALCVD™ HfO 2 N-MOSFET properties

2003
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Sub-nanometer high-k gate stack scaling using the HF-last/NH3 anneal interface

2003
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