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Doug Guenther
Doug Guenther
SEMATECH
Resist
Phase-shift mask
Electronic engineering
Engineering
Optics
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Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes
2003
Benjamin C. P. Ho
Doug Guenther
Mosong Cheng
Ken Sotoodeh
Anne Rudack
Richard Yamaguchi
Bob Brown
Marcus Ickes
Kathleen Nafus
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