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Richard Yamaguchi
Richard Yamaguchi
Resist
Electronic engineering
Materials science
Optics
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3
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4
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Procede et systeme de sechage d'un substrat
2004
Chung-Peng Ho
Kathleen Nafus
Kaz Yoshioka
Richard Yamaguchi
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Optical coupling of lens, liquid and resist in immersion lithography: rigorous model and assessment
2004
Mosong Cheng
Benjamin C. P. Ho
Richard Yamaguchi
Kazutoshi Yoshioka
Hidetami Yaegashi
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Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes
2003
Benjamin C. P. Ho
Doug Guenther
Mosong Cheng
Ken Sotoodeh
Anne Rudack
Richard Yamaguchi
Bob Brown
Marcus Ickes
Kathleen Nafus
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