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Benjamin C. P. Ho
Benjamin C. P. Ho
Electronic engineering
Optics
Materials science
Phase (waves)
Phase-shift mask
4
Papers
9
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Simulation of sub-90-nm node complementary phase-shift processes with ArF lithography
2003
Mosong Cheng
Benjamin C. P. Ho
Kathleen Nafus
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Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes
2003
Benjamin C. P. Ho
Doug Guenther
Mosong Cheng
Ken Sotoodeh
Anne Rudack
Richard Yamaguchi
Bob Brown
Marcus Ickes
Kathleen Nafus
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