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Cong Lu
Cong Lu
Semiconductor Manufacturing International Corporation
Computer science
Critical dimension
Wafer
Production line
Photomask
5
Papers
2
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0
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High temperature baking process study in advanced mask cleaning
2019
Dejian Li
Fen Xue
Cong Lu
Wenjun Ling
Xuefei Qin
Jie Wang
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Lithography printability review: an application on advanced photomask production for enhancing mask yield and cycle time
2019
Wen Jun Ling
Xue Fei Qin
De Jian Li
Fen Xue
Jie Wang
Cong Lu
Mingjing Tian
Ming Chen
Vikram L. Tolani
Gregg Inderhees
Alexander Tan
Suo Li
Xiao Di Liu
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A novel method to fast fix the post OPC weak-points through Calibre eqDRC application
2018
YaDong Jin
Shizhi Lyu
Cong Lu
Zexi Deng
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Big data analytics to improve photomask manufacturing productivity
2017
IEEM | Industrial Engineering and Engineering Management
Xiaoming Fan
Xuan Zhu
Kuei Chi Kuo
Cong Lu
Jason Wu
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Mask process correction method comparison and study: CD-SEM box versus standard correction method
2017
Mingjing Tian
Shizhi Lyu
Eric Guo
Ingo Bork
Peter Buck
Yifan Li
Delin Mo
Cong Lu
Kushlendra Mishra
Anil Parchuri
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