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Fen Xue
Fen Xue
Semiconductor Manufacturing International Corporation
Materials science
Critical dimension
Optoelectronics
Photomask
Wafer fabrication
4
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High temperature baking process study in advanced mask cleaning
2019
Dejian Li
Fen Xue
Cong Lu
Wenjun Ling
Xuefei Qin
Jie Wang
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Lithography printability review: an application on advanced photomask production for enhancing mask yield and cycle time
2019
Wen Jun Ling
Xue Fei Qin
De Jian Li
Fen Xue
Jie Wang
Cong Lu
Mingjing Tian
Ming Chen
Vikram L. Tolani
Gregg Inderhees
Alexander Tan
Suo Li
Xiao Di Liu
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A study of the TMAH based clean performance on advanced photomask
2018
Fen Xue
Irene Shi
Alan Li
Eric Tian
Ming Chen
Max Lu
Fei Xu
Wei Jiang
Jian Shen
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Pattern edge roughness study on OMOG mask repair
2018
Irene Shi
Xuefei Qin
Jie Wang
Fen Xue
Alan Li
Wenjun Ling
Elena Cong
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