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Mingjing Tian
Mingjing Tian
Semiconductor Manufacturing International Corporation
Critical dimension
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Metrology
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Lithography printability review: an application on advanced photomask production for enhancing mask yield and cycle time
2019
Wen Jun Ling
Xue Fei Qin
De Jian Li
Fen Xue
Jie Wang
Cong Lu
Mingjing Tian
Ming Chen
Vikram L. Tolani
Gregg Inderhees
Alexander Tan
Suo Li
Xiao Di Liu
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Mask process correction method comparison and study: CD-SEM box versus standard correction method
2017
Mingjing Tian
Shizhi Lyu
Eric Guo
Ingo Bork
Peter Buck
Yifan Li
Delin Mo
Cong Lu
Kushlendra Mishra
Anil Parchuri
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The study of CD side to side error in line/space pattern caused by post-exposure bake effect
2016
Jin Huang
Eric Guo
Haiming Ge
Max Lu
Yijun Wu
Mingjing Tian
Shichuan Yan
Ran Wang
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Contour-based two-dimension mask pattern metrology
2015
Mingjing Tian
Jianwei Wang
Hideaki Bandoh
Eric Guo
Max Lu
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