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Jota Fukuhara
Jota Fukuhara
Toshiba
Analytical chemistry
Plasma
Physics
Materials science
Sputtering
4
Papers
6
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Reactive ion etching process of SiO2 film using on-site synthesized C2F4 from CF4
2021
Japanese Journal of Applied Physics
Daiki Iino
Satoshi Tanida
Kazuaki Kurihara
Hiroyuki Fukumizu
Itsuko Sakai
Junko Abe
Jota Fukuhara
Rei Tanaka
Tomoyuki Tanaka
Jou Kikura
Hiroaki Kakiuchi
Kiyoshi Yasutake
Hiromasa Ohmi
Hisataka Hayashi
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On-site tetrafluoroethylene gas generation from moderate-pressure pure tetrafluoromethane plasma reactor
2020
Chemical Engineering Science
Hiromasa Ohmi
Jou Kikura
Tomoyuki Tanaka
Rei Tanaka
Daiki Iino
Itsuko Sakai
Kazuaki Kurihara
Hiroyuki Fukumizu
Junko Abe
Jota Fukuhara
Hisataka Hayashi
Hiroaki Kakiuchi
Kiyoshi Yasutake
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Evaluation of Gate Oxide Damage Caused by Ionization Magnetron Sputtering
2007
Japanese Journal of Applied Physics
Shigeki Matsunaka
Katsumi Iyanagi
Jota Fukuhara
Shuzi Hayase
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Stranski-Krastanov growth of tungsten during chemical vapor deposition revealed by micro-auger electron spectroscopy
2004
Japanese Journal of Applied Physics
Suguru Noda
Takeshi Tsumura
Jota Fukuhara
Takashi Yoda
Hiroshi Komiyama
Yukihiro Shimogaki
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Citations (5)
1