Old Web
English
Sign In
Acemap
>
Paper
>
Reactive ion etching process of SiO2 film using on-site synthesized C2F4 from CF4
Reactive ion etching process of SiO2 film using on-site synthesized C2F4 from CF4
2021
Daiki Iino
Satoshi Tanida
Kazuaki Kurihara
Hiroyuki Fukumizu
Itsuko Sakai
Junko Abe
Jota Fukuhara
Rei Tanaka
Tomoyuki Tanaka
Jou Kikura
Hiroaki Kakiuchi
Kiyoshi Yasutake
Hiromasa Ohmi
Hisataka Hayashi
Keywords:
Chemical engineering
Reactive-ion etching
Materials science
process
Correction
Source
Cite
Save
Machine Reading By IdeaReader
27
References
0
Citations
NaN
KQI
[]