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Olov Karlsson
Olov Karlsson
Semiconductor device
Capacitor
Metal gate
Work function
Semiconductor
3
Papers
9
Citations
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Atomic layer deposition of HfxAlyCz as a work function material in metal gate MOS devices
2014
Journal of Vacuum Science and Technology
Albert Lee
Nobi Fuchigami
Divya Pisharoty
Zhendong Hong
Ed Haywood
Amol Joshi
Salil Mujumdar
Ashish Bodke
Olov Karlsson
Hoon Kim
Kisik Choi
Paul R. Besser
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Citations (7)
Process to Etch Ni and Pt Residues during Silicide Contact Electrode Processing Using Low Temperature Aqueous Solutions
2013
Anh Duong
Clemens Fitz
Sven Metzger
Olov Karlsson
John Clayton Foster
Greg Nowling
Vincent Sih
Paul R. Besser
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Citations (2)
Procédé de nettoyage de résidus de platine sur un substrat de semi-conducteur
2012
Anh Duong
Sean Barstow
Olov Karlsson
Bei Li
James Mavrinac
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