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Vincent Sih
Vincent Sih
GlobalFoundries
Metallurgy
Wafer
Materials science
Composite material
Reactive-ion etching
4
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4
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Reduction of extra pattern defects in immersion layer reworks by cleans recipe optimization: CFM: Contamination free manufacturing
2016
ASMC | Advanced Semiconductor Manufacturing Conference
Dhiman Bhattacharyya
Wei Hong
Kay Peng
Vincent Sih
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Yield improvement and queue time relaxation at contact process
2016
ASMC | Advanced Semiconductor Manufacturing Conference
Niti Garg
Philippe Helal
Pranesh Muralidhar
Stephen Crown
Vincent Sih
Stephanie Waite
Silas Scott
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Selective Nitride Etching with Phosphoric and Sulfuric Acid Mixtures Using a Single-Wafer Wet Processor
2014
Solid State Phenomena
Vincent Sih
Berthold Reimer
Anthony S. Ratkovich
Jeffrey M. Lauerhaas
Jeffery W. Butterbaugh
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Process to Etch Ni and Pt Residues during Silicide Contact Electrode Processing Using Low Temperature Aqueous Solutions
2013
Anh Duong
Clemens Fitz
Sven Metzger
Olov Karlsson
John Clayton Foster
Greg Nowling
Vincent Sih
Paul R. Besser
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