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Oliver D. Patterson
Oliver D. Patterson
ASML Holding
Process window
Computer science
Electronic engineering
Failure rate
Lithography
4
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2
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0
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Stochastic defect criticality prediction enabled by physical stochastic modeling and massive metrology
2021
ChangAn Wang
Peigen Cao
Maxence Delorme
Jen-Yi Wuu
Jiyou Fu
Fuming Wang
Bob Lin
Yiqiong Zhao
Yi-Hsing Peng
Fan Yongfa
Mu Feng
Bin Cheng
Jen-Shiang Wang
Mark Simmoms
Stefan Hunsche
Oliver D. Patterson
Kuo-Feng Pao
Abdalmohsen Elmalk
Kevin Gao
Ruochong Fei
Xuefeng Zeng
Xiaolong Zhang
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Assessment of stochastic fail rate using E-beam massive metrology
2021
Wallace He
Camille Xu
Daniels Bae
K.-C. Chen
Andy Lan
Richer Yang
Abdalmohsen Elmalk
Aiqin Jiang
Fuming Wang
Double Chung
Shane Su
Kuo-Feng Pao
Oliver D. Patterson
Sudharshanan Raghunathan
Marc Kea
Jason Liao
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Multi-beam Inspection (MBI) development progress and applications
2020
Eric Ma
Weiming Ren
Xinan Luo
Shuo Zhao
Xuerang Hu
Xuedong Liu
Chiyan Kuan
Kevin Chou
Martijn Maassen
Weihua Yin
Aiden Chen
Niladri Sen
Martin Ebert
Lei Liu
Fei Wang
Oliver D. Patterson
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Rapid In-line Process Window Characterization Using Voltage Contrast Test Structures for Advanced FinFET Technology Development
2019
ASMC | Advanced Semiconductor Manufacturing Conference
Weihong Gao
Jeonghee Kim
Hsiao-Chi Peng
Chih-Chung Huang
Oliver D. Patterson
Yu-Chi Su
Hsiang Ting Yeh
Sean Starr-baier
Haokun Hu
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Citations (2)
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